Patent · US Active

Processing system

US8939108B2 · kind B2 · utility

1Cited by

17References

37Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Emmerich Bertagnolli · Munich, DE
Heinz Wanzenboeck · Wien, AT
Wolfram Buehler · Karlsruhe, DE
Camille Stebler · Fehren, CH
Ulrike Zeile · Heidenheim, DE
Alexander Rosenthal · Kempen, DE

Key dates

Filing date	Dec 8, 2012
Grant date	Jan 27, 2015
Priority date	—
Expiry date	Dec 8, 2032

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31744
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.