Patent · US Active

Method for manufacturing a hybrid integrated component

US8941193B2 · kind B2 · utility

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7Claims
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Key dates

Filing dateApr 24, 2013
Grant dateJan 27, 2015
Priority date
Expiry dateApr 24, 2033

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2203/0785
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A simple and cost-effective manufacturing method for hybrid integrated components including at least one MEMS element, a cap for the micromechanical structure of the MEMS element, and at least one ASIC substrate, using which a high degree of miniaturization may be achieved. The micromechanical structure of the MEMS element and the cap are manufactured in a layered structure, proceeding from a shared semiconductor substrate, by applying at least one cap layer to a first surface of the semiconductor substrate, and by processing and structuring the semiconductor substrate proceeding from its other second surface, to produce and expose the micromechanical MEMS structure. The semiconductor substrate is then mounted with the MEMS-structured second surface on the ASIC substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.