Optical characterization systems employing compact synchrotron radiation sources
US8941336B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 9, 2014 |
| Grant date | Jan 27, 2015 |
| Priority date | — |
| Expiry date | Jun 9, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/00
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A compact synchrotron radiation source includes an electron beam generator, an electron storage ring, one or more wiggler insertion devices disposed along one or more straight sections of the electron storage ring, the one or more wiggler insertion devices including a set of magnetic poles configured to generate a periodic alternating magnetic field suitable for producing synchrotron radiation emitted along the direction of travel of the electrons of the storage ring, wherein the one or more wiggler insertion devices are arranged to provide light to a set of illumination optics of a wafer optical characterization system or a mask optical characterization system, wherein the etendue of a light beam emitted by the one or more wiggler insertion devices is matched to the illumination optics of the at least one of a wafer optical characterization system and the mask optical characterization system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.