Inventor · Los Altos Hills, CA, US

Daniel Wack

33Patents
10h-index
54Co-inventors
78Inventor score

Filing activity: Sep 27, 2000 → Nov 5, 2020

Most-cited inventions

PatentTitleAreaCited byStatus
US7826071B2 Parametric profiling using optical spectroscopic systems Physics 95 Active
US7280230B2 Parametric profiling using optical spectroscopic systems Physics 42 Expired
US7099005B1 System for scatterometric measurements and applications Physics 39 Expired
US7716003B1 Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction Physics 23 Active
US7175945B2 Focus masking structures, focus patterns and measurements thereof Physics 21 Expired
US8941336B1 Optical characterization systems employing compact synchrotron radiation sources Electricity 20 Active
US6884552B2 Focus masking structures, focus patterns and measurements thereof Physics 16 Expired
US8749179B2 Optical characterization systems employing compact synchrotron radiation sources Electricity 15 Active
US7301649B2 System for scatterometric measurements and applications Physics 14 Expired
US8798966B1 Measuring critical dimensions of a semiconductor structure Electricity 11 Active
US7515253B2 System for measuring a sample with a layer containing a periodic diffracting structure Physics 9 Active
US8045179B1 Bright and dark field scatterometry systems for line roughness metrology Physics 8 Active
US10438825B2 Spectral reflectometry for in-situ process monitoring and control Electricity 6 Active
US9544984B2 System and method for generation of extreme ultraviolet light Emerging Cross-Sectional Technologies 6 Active
US11333621B2 Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction Electricity 6 Active
US9295147B2 EUV light source using cryogenic droplet targets in mask inspection Emerging Cross-Sectional Technologies 5 Active
US7826072B1 Method for optimizing the configuration of a scatterometry measurement system Physics 4 Active
US9164388B2 Temperature control in EUV reticle inspection tool Physics 4 Active
US8842272B2 Apparatus for EUV imaging and methods of using same Physics 4 Active
US7511830B2 System for scatterometric measurements and applications Physics 4 Active
US7838309B1 Measurement and control of strained devices Physics 2 Active
US7821654B2 System for scatterometric measurements and applications Physics 2 Active
US8917432B2 Multiplexing EUV sources in reticle inspection Physics 1 Active
US9335637B2 Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation Electricity 1 Active
US9625810B2 Source multiplexing illumination for mask inspection Physics 1 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.