Patent · US Active

Method and device for cleaning at least one optical component

US8945310B2 · kind B2 · utility

7Cited by

1References

11Claims

0Family size

Assignee

KONINKLIJKE PHILIPS ELECTRONICS NV · NL

Inventors

Peter Zink · Aachen, DE
Joseph Pankert · Aachen, DE
Guenther Hans Derra · Aachen, DE
Achim Weber · Altbach, DE

Key dates

Filing date	May 18, 2004
Grant date	Feb 3, 2015
Priority date	—
Expiry date	Nov 1, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70941
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of cleaning at least one optical component of at least one irradiation device having at least one radiation source in a vacuum chamber. The source generates in particular extreme ultraviolet and/or soft X-ray radiation whose rays are guided via the optical component onto a workpiece to be treated, during which the optical component is at least partly polluted because of an inorganic substance introduced by the radiation source. A least one reaction partner that is substantially translucent or transparent to the rays is introduced via a feeder device in dependence on the prevailing reaction conditions. The reaction partner reacts chemically with the polluting deposits so as to remove them from the optical component.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.