Acid generators and photoresists comprising same
US8945814B2 · kind B2 · utility
10Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 16, 2013 |
| Grant date | Feb 3, 2015 |
| Priority date | — |
| Expiry date | Sep 16, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/86
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.