Liquid processing apparatus, liquid processing method and computer-readable storage medium storing liquid processing program
US8951359B2 · kind B2 · utility
2Cited by
3References
6Claims
0Family size
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Key dates
| Filing date | May 13, 2011 |
| Grant date | Feb 10, 2015 |
| Priority date | — |
| Expiry date | Aug 17, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
There is provided a liquid processing method for performing a liquid process on a front surface of a substrate by using a processing solution and then performing a rinse process on the front surface of the substrate by using a rinse solution having a temperature lower than a temperature of the processing solution. The liquid processing method includes performing an intermediate process between the liquid process and the rinse process, for adjusting a temperature of the front surface of the substrate to a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.