Method for producing a multilayer coating and device for carrying out said method

US8956511B2 · kind B2 · utility

Assignee

• Leybold Optics GmbH · DE

Inventors

• Michael Scherer · Crimmitschau, DE
• Jurgen Pistner · Alzenau, DE
• Walter Lehnert · Bühl, DE
• Harro Hagedorn · Frankfurt, DE
• Gerd Deppisch · Aschaffenburg, DE
• Mario Roder · Mönchengladbach, DE

Key dates

• Filing date: Dec 3, 2003
• Grant date: Feb 17, 2015
• Expiry date: Jun 10, 2027

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/3321
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a residual gas using a sputtering device. Reactive depositing a coating on the substrate by adding a reactive component with a predetermined stoichiometric deficit in a zone of the sputtering device. Displacing the substrate with the deposited coating into the vicinity of a plasma source, which is located in the vacuum chamber at a predetermined distance from the sputtering device. The plasma action of the plasma source modifying the structure and/or stoichiometry of the coating, preferably by adding a predetermined quantity of the reactive component to reduce the optical loss of the coating.