Layout decomposition method
US8959460B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 31, 2013 |
| Grant date | Feb 17, 2015 |
| Priority date | — |
| Expiry date | Jul 31, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of assigning layout patterns includes identifying a first set of layout patterns of a current layout design that is new or has been modified in comparison with a reference layout design. A second set of layout patterns of the current layout design is identified. A member of the second set of layout patterns that is not a member of the first set of layout patterns has a distance, less than a predetermined threshold distance, to at least another member of the second set of layout patterns. A third set of layout patterns is not modified in comparison with the reference layout design. The third set of layout patterns is assigned to a plurality of masks according to the reference pattern-assigning result.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.