Inventor · New Taipei, TW

Ming-Hui Chih

31Patents
8h-index
54Co-inventors
74Inventor score

Filing activity: Feb 9, 2010 → Jul 26, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US9390217B2 Methodology of optical proximity correction optimization Physics 64 Active
US8627241B2 Pattern correction with location effect Physics 45 Active
US8631360B2 Methodology of optical proximity correction optimization Physics 34 Active
US8527916B1 Dissection splitting with optical proximity correction to reduce corner rounding Emerging Cross-Sectional Technologies 31 Active
US8943445B2 Method of merging color sets of layout Physics 28 Active
US8381153B2 Dissection splitting with optical proximity correction and mask rule check enforcement Emerging Cross-Sectional Technologies 19 Active
US9679100B2 Environmental-surrounding-aware OPC Physics 19 Active
US8631379B2 Decomposing integrated circuit layout Physics 18 Active
US9176373B2 System and method for decomposition of a single photoresist mask pattern into 3 photoresist mask patterns Physics 8 Active
US9411924B2 Methodology for pattern density optimization Physics 3 Active
US10324369B2 Methods for generating a mandrel mask Emerging Cross-Sectional Technologies 3 Active
US9911606B2 Mandrel spacer patterning in multi-pitch integrated circuit manufacturing Electricity 3 Active
US9165095B2 Target point generation for optical proximity correction Physics 3 Active
US8972909B1 OPC method with higher degree of freedom Physics 3 Active
US9189588B2 Polygon-based optical proximity correction Physics 3 Active
US9026955B1 Methodology for pattern correction Electricity 3 Active
US11048161B2 Optical proximity correction methodology using pattern classification for target placement Physics 2 Active
US9390223B2 Method of determining whether a layout is colorable Physics 2 Active
US10049178B2 Methodology for pattern density optimization Physics 1 Active
US11790145B2 Method for coloring circuit layout and system for performing the same Physics 0 Active
US8959460B1 Layout decomposition method Physics 0 Active
US10509881B2 Method for coloring circuit layout and system for performing the same Physics 0 Active
US10527928B2 Optical proximity correction methodology using pattern classification for target placement Physics 0 Active
US8196072B2 Method and apparatus of patterning semiconductor device Physics 0 Active
US11392742B2 Method for coloring circuit layout and system for performing the same Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.