Actinic-ray—or radiation-sensitive resin composition and method of forming pattern using the composition
US8962233B2 · kind B2 · utility
3Cited by
3References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 28, 2011 |
| Grant date | Feb 24, 2015 |
| Priority date | — |
| Expiry date | Oct 5, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated upon exposure to actinic rays or radiation having a volume of 240 Å3 or greater.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.