Optically absorptive material for alignment marks
US8967992B2 · kind B2 · utility
2Cited by
15References
9Claims
0Family size
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Key dates
| Filing date | Apr 25, 2012 |
| Grant date | Mar 3, 2015 |
| Priority date | — |
| Expiry date | Nov 27, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2462
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.