Composition for resist underlayer film and process for producing same
US8968458B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 2, 2010 |
| Grant date | Mar 3, 2015 |
| Priority date | — |
| Expiry date | Sep 8, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A),R1bR2cSi(OR3)4-a (A)wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.