Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation
US8968838B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 12, 2011 |
| Grant date | Mar 3, 2015 |
| Priority date | — |
| Expiry date | Jul 12, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3348
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method is provided for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a trapezoidal waveform comprising a ramp-up, a high plateau, a ramp-down and a low plateau. The plasma density can be controlled by adjusting the duration of the ramp-up, the duration of the ramp-down, the amplitude and the repetition rate of the trapezoidal waveform. The ion energy distribution function at the substrate can be controlled by adjusting the amplitude and the relative duration between the high plateau and the low plateau of the trapezoidal waveform.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.