Pellicles with reduced particulates
US8968971B2 · kind B2 · utility
4Cited by
5References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 8, 2013 |
| Grant date | Mar 3, 2015 |
| Priority date | — |
| Expiry date | Sep 14, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/64
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may be secured to a photomask using non-adhesive attachment members that contact a side surface of the photomask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.