Patent · US Active

Coating compositions for use with an overcoated photoresist

US8968981B2 · kind B2 · utility

5Cited by

16References

5Claims

0Family size

Inventors

Vipul Jain · Irvine, US
Owendi Ongayi · Marlborough, US
Suzanne M. Coley · Mansfield, US
Anthony Zampini · Westborough, US

Key dates

Filing date	Dec 30, 2011
Grant date	Mar 3, 2015
Priority date	—
Expiry date	Dec 30, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/31786
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Organic coating compositions, particularly antireflective compositions, that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and can serve as a planarizing, conformal or via-fill layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.