Photoresist compositions and methods of forming photolithographic patterns
US8975001B2 · kind B2 · utility
12Cited by
4References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 28, 2012 |
| Grant date | Mar 10, 2015 |
| Priority date | — |
| Expiry date | Mar 1, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.