Patent · US Active

Developer compositions and methods of forming photolithographic patterns

US8980536B2 · kind B2 · utility

3Cited by

5References

5Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Young Cheol Bae · Weston, US
Seung Hyun Lee · Seojong-myeon, KR

Key dates

Filing date	Feb 28, 2012
Grant date	Mar 17, 2015
Priority date	—
Expiry date	Feb 28, 2032

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/24355
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Provided are photoresist developer compositions that include a mixture of organic solvents. Also provided are methods of forming photolithographic patterns using negative tone development, coated substrates and electronic devices formed by the methods. The methods find particular applicability in the manufacture of electronic devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.