Patent · US Active

Compositions and methods for texturing polycrystalline silicon wafers

US8986559B2 · kind B2 · utility

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24Claims
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Key dates

Filing dateFeb 27, 2013
Grant dateMar 24, 2015
Priority date
Expiry dateFeb 27, 2033

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/547
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

Compositions and methods for chemical texturing a surface of a polycrystalline silicon wafer to be used in the manufacture of solar cells provide increased efficiency in the manufacture and operation of solar cells. The compositions and methods disclosed herein include first and second components, wherein the first component is a UKON etch composition, including a hydrofluoric acid/nitric acid mixture and water, while the second component includes a silicon wafer texturing enhancer (SWTE).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.