Compositions and methods for texturing polycrystalline silicon wafers
US8986559B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 27, 2013 |
| Grant date | Mar 24, 2015 |
| Priority date | — |
| Expiry date | Feb 27, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/547
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Compositions and methods for chemical texturing a surface of a polycrystalline silicon wafer to be used in the manufacture of solar cells provide increased efficiency in the manufacture and operation of solar cells. The compositions and methods disclosed herein include first and second components, wherein the first component is a UKON etch composition, including a hydrofluoric acid/nitric acid mixture and water, while the second component includes a silicon wafer texturing enhancer (SWTE).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.