Method for manufacturing liquid discharge head
US8993357B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2014 |
| Grant date | Mar 31, 2015 |
| Priority date | — |
| Expiry date | Mar 5, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2/1639
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A method for manufacturing a liquid discharge includes a process of forming a plurality of blind holes extending from a first surface of the silicon substrate toward a second surface which is a surface opposite to the first surface in the silicon substrate and a process of subjecting the silicon substrate in which the plurality of blind holes are formed to anisotropic etching from the first surface to form a liquid supply port in the silicon substrate, in which, in the process of forming the liquid supply port, the silicon in a region sandwiched by the plurality of blind holes when the silicon substrate is seen from the second surface side is left without being removed by the anisotropic etching to use the left silicon as a beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.