Keisuke Kishimoto
20Patents
5h-index
28Co-inventors
65Inventor score
Filing activity: Apr 18, 2008 → Feb 27, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8091234B2 | Manufacturing method for liquid discharge head substrate | Emerging Cross-Sectional Technologies | 10 | Active |
| US8429820B2 | Method of manufacturing liquid discharge head | Emerging Cross-Sectional Technologies | 9 | Active |
| US8177988B2 | Method for manufacturing liquid discharge head | Performing Operations; Transporting | 9 | Active |
| US8613862B2 | Method for manufacturing liquid discharge head substrate | Performing Operations; Transporting | 6 | Active |
| US8114305B2 | Method of manufacturing substrate for liquid discharge head | Performing Operations; Transporting | 5 | Active |
| US9333749B2 | Method for manufacturing liquid ejection head substrate | Emerging Cross-Sectional Technologies | 3 | Active |
| US8287747B2 | Method of processing silicon substrate and method of manufacturing substrate for liquid discharge head | Performing Operations; Transporting | 3 | Active |
| US8197705B2 | Method of processing silicon substrate and method of manufacturing liquid discharge head | Performing Operations; Transporting | 2 | Active |
| US8858812B2 | Processing method for an ink jet head substrate | Emerging Cross-Sectional Technologies | 2 | Active |
| US10363696B2 | Process for production of embossed films based on plasticized polyvinyl acetal | Performing Operations; Transporting | 2 | Active |
| US8597529B2 | Method for processing substrate and method for producing liquid ejection head and substrate for liquid ejection head | Performing Operations; Transporting | 1 | Active |
| US8492281B2 | Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate | Chemistry; Metallurgy | 1 | Active |
| US8182072B2 | Substrate for inkjet printing head and method for manufacturing the substrate | Performing Operations; Transporting | 1 | Active |
| US8435805B2 | Method of manufacturing a substrate for liquid ejection head | Performing Operations; Transporting | 1 | Active |
| US10391772B2 | Silicon substrate processing method and liquid ejection head manufacturing method | Performing Operations; Transporting | 0 | Active |
| US8993357B2 | Method for manufacturing liquid discharge head | Performing Operations; Transporting | 0 | Active |
| US8951815B2 | Method for producing liquid-discharge-head substrate | Performing Operations; Transporting | 0 | Active |
| US8975097B2 | Method of manufacturing liquid discharge head | Performing Operations; Transporting | 0 | Active |
| US9669628B2 | Liquid ejection head substrate, method of manufacturing the same, and method of processing silicon substrate | Performing Operations; Transporting | 0 | Active |
| US8549750B2 | Method of manufacturing liquid discharge head substrate and method of processing the substrate | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.