Patent · US Active

Method and system of providing dopant concentration control in different layers of a semiconductor device

US9006020B2 · kind B2 · utility

0Cited by

17References

25Claims

0Family size

Assignee

First Solar, Inc. · US

Inventors

Gang Xiong · Beaverton, US
Rick C. Powell · Ann Arbor, US
Xilin Peng · Bloomington, US
John Barden · Middletown, US
Arnold Allenic · San Jose, US
Feng Liao · Perrysburg, US
Kenneth M. Ring · Waterville, US

Key dates

Filing date	Jan 11, 2013
Grant date	Apr 14, 2015
Priority date	—
Expiry date	Feb 17, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02E10/543
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method and system for controlling the amount of a second material incorporated into a first material by controlling the amount of a third material which can interact with the second material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.