Patent · US Active

Method of depositing protective structures

US9006681B2 · kind B2 · utility

0Cited by

9References

25Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Heinz Wanzenboeck · Wien, AT
Wolfram Buehler · Karlsruhe, DE
Holger Doemer · Bopfingen, DE
Carl Kuebler · Aalen, DE
Daniel Fischer · Furth, DE
Gottfried Hochleitner · Wien, AT
Emmerich Bertagnolli · Munich, DE

Key dates

Filing date	Mar 10, 2014
Grant date	Apr 14, 2015
Priority date	—
Expiry date	Mar 10, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31749
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.