Apparatus and method for printing a periodic pattern with a large depth of focus
US9007566B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2013 |
| Grant date | Apr 14, 2015 |
| Priority date | — |
| Expiry date | Jul 30, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and a method for printing a desired pattern into a photosensitive layer. A mask bears a pattern of linear mask features parallel to a first direction. The layer is arranged parallel to and separated from the mask. Substantially monochromatic light is generated and the mask pattern is illuminated with the light over a range of angles of incidence in a plane parallel to the first direction, at substantially a single angle in an orthogonal plane of incidence and so that the light of each angle of incidence transmitted by the mask forms a light-field component at the layer. The integration of the components prints the desired pattern. The range of angles is selected so that the integration of the components is substantially equivalent to an average of the range of transversal intensity distributions formed between Talbot image planes by light at one of the angles of incidence.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.