Patent · US Active

Methods of forming molybdenum sputtering targets

US9017600B2 · kind B2 · utility

1Cited by
5References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 25, 2013
Grant dateApr 28, 2015
Priority date
Expiry dateOct 31, 2033

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB22F2998/10
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

In various embodiments, planar sputtering targets are produced by forming a billet at least by pressing molybdenum powder in a mold and sintering the pressed powder, working the billet to form a worked billet, heat treating the worked billet, working the worked billet to form a final billet, and heat treating the final billet.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.