Methods of forming molybdenum sputtering targets
US9017600B2 · kind B2 · utility
1Cited by
5References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2013 |
| Grant date | Apr 28, 2015 |
| Priority date | — |
| Expiry date | Oct 31, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2998/10
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
In various embodiments, planar sputtering targets are produced by forming a billet at least by pressing molybdenum powder in a mold and sintering the pressed powder, working the billet to form a worked billet, heat treating the worked billet, working the worked billet to form a final billet, and heat treating the final billet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.