Photodiode and production method
US9018726B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | May 4, 2012 |
| Grant date | Apr 28, 2015 |
| Priority date | — |
| Expiry date | May 4, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/50
Abstract
The photodiode has a p-type doped region (2) and an n-type doped region (3) in a semiconductor body (1), and a pn junction (4) between the p-type doped region and the n-type doped region. The semiconductor body has a cavity (5) such that the pn junction (4) has a distance (d) of at most 30 μm from the bottom of the cavity (7).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.