Patent · US Active

Methods for processing substrates

US9023716B2 · kind B2 · utility

5Cited by
8References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 6, 2014
Grant dateMay 5, 2015
Priority date
Expiry dateJan 6, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/977
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method for processing substrates includes providing a bonding layer between a substrate and a carrier to bond the substrate to the carrier, processing the substrate while the substrate is supported by the carrier, and removing the bonding layer to separate the substrate from the carrier. The bonding layer may include a thermosetting release layer and thermosetting glue layers, wherein at least one of the thermosetting glue layers is provided on each side of the thermosetting release layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.