Patent · US Active

Growth of large aluminum nitride single crystals with thermal-gradient control

US9028612B2 · kind B2 · utility

8Cited by
116References
24Claims
0Family size

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Key dates

Filing dateJun 30, 2011
Grant dateMay 12, 2015
Priority date
Expiry dateDec 20, 2033

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B29/403
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

In various embodiments, non-zero thermal gradients are formed within a growth chamber both substantially parallel and substantially perpendicular to the growth direction during formation of semiconductor crystals, where the ratio of the two thermal gradients (parallel to perpendicular) is less than 10, by, e.g., arrangement of thermal shields outside of the growth chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.