Growth of large aluminum nitride single crystals with thermal-gradient control
US9028612B2 · kind B2 · utility
8Cited by
116References
24Claims
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Key dates
| Filing date | Jun 30, 2011 |
| Grant date | May 12, 2015 |
| Priority date | — |
| Expiry date | Dec 20, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/403
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In various embodiments, non-zero thermal gradients are formed within a growth chamber both substantially parallel and substantially perpendicular to the growth direction during formation of semiconductor crystals, where the ratio of the two thermal gradients (parallel to perpendicular) is less than 10, by, e.g., arrangement of thermal shields outside of the growth chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.