Exhaust flow spreading baffle-riser to optimize remote plasma window clean
US9028765B2 · kind B2 · utility
8Cited by
46References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2013 |
| Grant date | May 12, 2015 |
| Priority date | — |
| Expiry date | Oct 24, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Porogen accumulation in a UV-cure chamber may be reduced by removing outgassed porogen by flowing a purge gas across a window through which a wafer is exposed to UV light. Porogens in the purge gas stream may, as they flow through the chamber and into an exhaust baffle, deposit on surfaces within the chamber, including on the exhaust baffle. The exhaust baffle may have particular features that cause such porogen deposition to be more uniformly distributed across the exhaust baffle, thus reducing the amount of time that may be required to fully clean the baffle of accumulated porogens during a cleaning process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.