Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions

US9036133B2 · kind B2 · utility

Assignee

• Eulitha AG · CH

Inventors

• Harun Solak · Brugg, CH
• Christian Dais · Turgi, CH
• Francis Clube · Windisch, CH

Key dates

• Filing date: Aug 26, 2011
• Grant date: May 19, 2015
• Expiry date: Dec 4, 2033

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70408
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.