Micro purge of plasma region
US9036146B2 · kind B2 · utility
9Cited by
7References
3Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 21, 2013 |
| Grant date | May 19, 2015 |
| Priority date | — |
| Expiry date | Mar 15, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0221
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An analysis system includes a laser source generating a laser beam for creating a plasma at a location on a sample. A spectrometer is responsive to photons emitted by the sample at said location and has an output. At least one nozzle is configured to deliver inert gas from a source locally to the location on the sample. A controller is responsive to a trigger signal and is configured to activate the laser source generating a series of laser pulses, open a valve to purge the location locally on the sample, and close the valve after one or more laser pulses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.