Electron beam lithography with linear column array and rotary stage
US9040942B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 11, 2008 |
| Grant date | May 26, 2015 |
| Priority date | — |
| Expiry date | Nov 21, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31789
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
One embodiment relates to an apparatus for electron beam lithography which includes a linear array of reflection electron beam lithography columns and a rotary stage. Each column is separately controllable to write a portion of a lithographic pattern onto a substrate. The rotary stage is configured to hold multiple substrates and to be rotated under the linear array of reflection electron beam lithography columns. Another embodiment relates to a method of electron beam lithography which includes simultaneously rotating and linearly translating a stage holding a plurality of wafers, and writing a lithography pattern using a linear array of reflection electron beam lithography columns over the stage. Each said column traverses a spiral path over the stage as the stage is rotated and linearly translated. Other embodiments, aspects and feature are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.