Spectral purity filters for use in a lithographic apparatus
US9041912B2 · kind B2 · utility
2Cited by
8References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2012 |
| Grant date | May 26, 2015 |
| Priority date | — |
| Expiry date | Jul 18, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/10
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.