Microwave plasma abatement apparatus
US9044707B2 · kind B2 · utility
1Cited by
22References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 25, 2006 |
| Grant date | Jun 2, 2015 |
| Priority date | — |
| Expiry date | May 13, 2031 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2259/818
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.