Photoacid generator, photoresist, coated substrate, and method of forming an electronic device
US9046767B2 · kind B2 · utility
5Cited by
16References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2013 |
| Grant date | Jun 2, 2015 |
| Priority date | — |
| Expiry date | Nov 13, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoacid generator compound has the formula (1)wherein a, b, c, d, e, x, L1, L2, L3, L4, R1, R2, X, and Z− are defined herein. The photoacid generator compound exhibits good solubility in solvents typically used to formulate photoresist compositions and negative tone developers. Described herein are a photoresist composition including the photoacid generator compound, a coated substrate including the photoresist composition, and a device-forming method utilizing the photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.