Structure and method for reflective-type mask
US9046781B2 · kind B2 · utility
1Cited by
0References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 17, 2013 |
| Grant date | Jun 2, 2015 |
| Priority date | — |
| Expiry date | Nov 29, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure provides an embodiment of a reflective mask that includes a substrate; a reflective multilayer formed on the substrate; a capping layer formed on the reflective multilayer and having a hardness greater than about 8; and an absorber layer formed on the capping layer and patterned according to an integrated circuit layout.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.