EUVL light source system and method
US9049774B2 · kind B2 · utility
1Cited by
1References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 16, 2014 |
| Grant date | Jun 2, 2015 |
| Priority date | — |
| Expiry date | Jul 16, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/009
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
EUVL light source systems and methods are provided. A laser or a high-voltage-discharge device is used to excite EUV light source material to generate EUV light along with droplets flying out of the EUV light source material. A collector is positioned to guide the EUV light into a desired direction. A cooling assembly is configured to wrap around the collector along the EUV light in the desired direction. At least a first portion of the plurality of molten droplets reaches and condenses on a surface of the cooling assembly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.