Patent · US Active

Microlithographic projection exposure apparatus illumination optics

US9052611B2 · kind B2 · utility

1Cited by

11References

32Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventor

Alexander Kohl · Aalen, DE

Key dates

Filing date	Dec 14, 2011
Grant date	Jun 9, 2015
Priority date	—
Expiry date	Mar 4, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70566
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.