Verification of fractured mask data
US9053286B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2014 |
| Grant date | Jun 9, 2015 |
| Priority date | — |
| Expiry date | Mar 25, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/04
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Fractured mask data in variable shape beam format is verified. The fractured mask data and unfractured design data from which the fractured mask data was generated is received, as is at least one control parameter related to the fractured mask data. A filter algorithm is performed with the at least one control parameter as an input. The filter algorithm identifies at least one error in the fractured mask data as compared to the unfractured design data other than approximation differences resulting from a fracture algorithm used to generate the fractured mask data. The at least one error includes an edge shift in the fractured mask data as compared to the unfractured design data that is smaller than a defined value, such as the maximum skew value in certain examples.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.