Notch detection and correction in mask design data
US9053287B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2014 |
| Grant date | Jun 9, 2015 |
| Priority date | — |
| Expiry date | Mar 25, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Mask data is analyzed for the presence of a notch. A notch candidate on a polygon boundary of mask data is defined as a plurality of line segments that includes an initial line segment, a final line segment and at least two line segments therebetween. The initial and final line segments define adjacent edges of the notch candidate and have an angle therebetween within a defined range. A direction of each line segment is a direction of travel from the initial line segment to the final line segment. A plurality of conditions is applied to the plurality of line segments and the direction of travel, and the notch candidate is a notch when all conditions are satisfied. The notch may be removed from the data before mask writing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.