Patent · US Active

Metrological scale

US9057630B2 · kind B2 · utility

0Cited by
1References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 21, 2009
Grant dateJun 16, 2015
Priority date
Expiry dateMar 1, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01D5/34784
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method of applying a marking onto a metrological scale. The method comprises locating one or more markings on the scale substrate in a provisional state; checking whether the one or more markings located on the scale substrate are acceptable; and finalising the one or markings which are acceptable so as to transform the one or more markings into a finalised state.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.