Patent · US Active

Source-collector module with GIC mirror and LPP EUV light source

US9057962B2 · kind B2 · utility

1Cited by

4References

11Claims

0Family size

Assignee

MEDIA LARIO S.R.L. · IT

Inventors

Natale M. Ceglio · Pleasanton, US
Giovanni Nocerino · Pleasanton, US
Fabio Zocchi · Samarate, IT

Key dates

Filing date	Dec 2, 2012
Grant date	Jun 16, 2015
Priority date	—
Expiry date	Jan 21, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/064
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.