Microelectromechanical device and method of manufacturing
US9063333B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2012 |
| Grant date | Jun 23, 2015 |
| Priority date | — |
| Expiry date | Mar 22, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG09G3/346
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A display apparatus includes a backlight and an aperture layer that is positioned in front of the backlight and defines a plurality of apertures. The display apparatus also includes a microelectromechanical system (MEMS) light modulator configured to modulate light emitted by the backlight passing through the apertures to form an image on the display apparatus. The MEMS light modulator includes a shutter that has a light blocking portion having an aperture layer-facing surface and a front-facing surface and at least one depression formed in the light blocking portion. The width of the at least one depression accounts for at least 50% but less than 100% of a distance separating two edges of the shutter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.