Patent · US Active

Optical element having a plurality of reflective facet elements

US9063336B2 · kind B2 · utility

2Cited by

6References

29Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Marc Kirch · Wedel, DE
Martin Endres · Oberkochen, DE
Damian Fiolka · Oberkochen, DE
Joachim Hartjes · Aalen, DE

Key dates

Filing date	Jun 1, 2012
Grant date	Jun 23, 2015
Priority date	—
Expiry date	Jan 19, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/0891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element has at least one reflective surface. In this case, at least one facet element is arranged in a manner rotatable about a rotation axis. The rotation axis intersects the at least one reflective surface of the facet element. With such an optical element, it is possible to alter the direction and/or the intensity of at least part of the illumination radiation within the illumination optical unit in a simple manner.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.