Patent · US Active

Method for making micron or submicron cavities

US9063410B2 · kind B2 · utility

0Cited by

9References

12Claims

0Family size

Assignee

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

Stéphane Caplet · Saint-Égrève, FR
Claude Venin · Voiron, FR

Key dates

Filing date	May 16, 2011
Grant date	Jun 23, 2015
Priority date	—
Expiry date	Sep 20, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/2014
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for forming a micro-optical or sub-micro-optical device is provided, including: forming a photolithographic mask on a transparent support, depositing a layer of a photosensitive material of negative polarity on the face, a so called front face, of the support which supports the mask, wherein the mask is disposed under the areas where the photosensitive material should be removed, insolating the layer of the photosensitive material through the rear face of the support, developing the photosensitive material in order to obtain walls of micron or submicron cavities, removing the mask areas located at the bottom of the cavities in order to obtain cavities without any mask material between the walls, introducing a fluid into the cavities of the device, and forming a closure layer on the walls in photosensitive material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.