Photoresist composition
US9063414B2 · kind B2 · utility
3Cited by
34References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 25, 2011 |
| Grant date | Jun 23, 2015 |
| Priority date | — |
| Expiry date | Jul 25, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a photoresist composition comprising wherein R1 and R2 are independently in each occurrence a C1-C12 hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom, and m and n independently each represent an integer of 0 to 4.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.