Projection objective for microlithography with stray light compensation and related methods

US9063439B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Aksel Goehnermeier · Aalen, DE
• Daniel Kraehmer · Aalen, DE
• Vladimir Kamenov · Oberkochen, DE
• Michael Totzeck · Schwäbisch Gmünd, DE

Key dates

• Filing date: Nov 24, 2009
• Grant date: Jun 23, 2015
• Expiry date: Jan 23, 2032

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70941
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed. The projection objective includes an optical component configured so that, during use of the projection objective, the optical component generates a stray light component in the exposure field of the projection objective which adapts a parameter of the projection objective to a parameter of a second projection objective. The parameter is the stray light component at the exposure field of the projection objective and/or a variation of the stray light component at the exposure field of the projection objective. The parameter of the second projection objective is a stray light component at an exposure field of the second projection objective and/or a variation of the stray light component at the exposure field of the second projection objective. The second projection objective is different from the projection objective.