Electrochemical removal of tantalum-containing materials
US9068273B2 · kind B2 · utility
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Key dates
| Filing date | Jun 10, 2011 |
| Grant date | Jun 30, 2015 |
| Priority date | — |
| Expiry date | Oct 22, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/20
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of cleaning metal-containing deposits from a metal surface of a process chamber component includes immersing the metal surface in an electrochemical cleaning bath solution. A negative electrical bias is applied to the metal surface to electrochemically clean the metal-containing deposits from the metal surface. The cleaning method is capable of removing metal-containing deposits such as tantalum-containing deposits from the metal surface substantially without eroding the surface, and may be especially advantageous in the cleaning of components having textured surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.