Dynamic peak tracking in X-ray photoelectron spectroscopy measurement tool
US9080948B2 · kind B2 · utility
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17References
16Claims
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Key dates
| Filing date | Mar 14, 2013 |
| Grant date | Jul 14, 2015 |
| Priority date | — |
| Expiry date | Jul 18, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/6113
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for performing X-ray Photoelectron Spectroscopy (XPS) measurements in a semiconductor environment are disclosed. A reference element peak is selected and tracked as part of the measurement process. Peak shift of the reference element peak, in electron volts (eV) is tracked and applied to other portions of acquired spectrum to compensate for the shift, which results from surface charge fluctuation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.