Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition
US9081277B2 · kind B2 · utility
3Cited by
3References
15Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 22, 2011 |
| Grant date | Jul 14, 2015 |
| Priority date | — |
| Expiry date | Apr 14, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.